Revolutionizing the future of photovoltaics, one step at a time.
Step
1
Release layer formation
The first step in our patented process is creation of a precisely engineered silicon release layer on the seed wafer substrate with scalability to mass production.
Step
2
Deposition
The heart of the EpiNex® process is the high throughput in-line CVD direct ‘gas to wafer’ deposition process. This enables >40% less energy consumption than conventional CZ and wafering and significantly less waste.
Step
3
Detachment
The EpiNex® wafer is detached from the seed wafer substrate and the seed wafer recycled for continued use.
Step
4
Post Treatment
The EpiNex® wafer undergoes a final post treatment and is ready for packaging.
Step
5
The EpiNex® wafer
The finished wafer offers the highest level of quality and repeatability and is a drop in replacement for conventional CZ wafers.
